Приказ основних података о документу

dc.creatorZečević, S.K.
dc.creatorZotović, Jelena B.
dc.creatorGojković, Snežana Lj.
dc.creatorRadmilović, V.
dc.date.accessioned2021-03-10T09:46:37Z
dc.date.available2021-03-10T09:46:37Z
dc.date.issued1998
dc.identifier.issn1572-6657
dc.identifier.urihttp://TechnoRep.tmf.bg.ac.rs/handle/123456789/216
dc.description.abstractThin Fe-P alloy films (0.5 to 25.0 mu m thick) were electrodeposited from sulfate solutions. The influences of various deposition conditions (current density, time, pH and temperature) on the composition and structure of the deposited films were examined. These Fe-P films were first characterized by the ALSV. The voltammograms obtained show several current peaks, indicating the presence of several different phase structures in the deposit. Chemical composition of the phase structures in the film was determined by EDX analysis and the amorphous nature of the alloy was verified by XRD and DTA techniques. Chemical and phase structure compositions of the alloys (containing 15-50 at.% P in the form of phosphides FeP, Fe2P and/or Fe3P) were found to depend on deposition conditions. Appearance and morphology of the film alloys were also found to depend on deposition conditions, particularly current density, as illustrated by the SEM technique.en
dc.publisherElsevier Science Sa, Lausanne
dc.rightsrestrictedAccess
dc.sourceJournal of Electroanalytical Chemistry
dc.subjectiron-phosphorous alloyen
dc.subjectamorphous alloysen
dc.subjectelectrodepositionen
dc.subjectthin filmsen
dc.titleElectrochemically deposited thin films of amorphous Fe-P alloy Part I. Chemical composition and phase structure characterizationen
dc.typearticle
dc.rights.licenseARR
dc.citation.epage252
dc.citation.issue2
dc.citation.other448(2): 245-252
dc.citation.spage245
dc.citation.volume448
dc.identifier.doi10.1016/S0022-0728(97)00417-8
dc.identifier.scopus2-s2.0-0032064068
dc.identifier.wos000075475600012
dc.type.versionpublishedVersion


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Приказ основних података о документу