Приказ основних података о документу

dc.creatorGojković, Snežana Lj.
dc.creatorZečević, S.K.
dc.creatorDražić, Dragutin M.
dc.date.accessioned2021-03-10T09:34:41Z
dc.date.available2021-03-10T09:34:41Z
dc.date.issued1992
dc.identifier.issn0013-4686
dc.identifier.urihttp://TechnoRep.tmf.bg.ac.rs/handle/123456789/34
dc.description.abstractThe kinetics of hydrogen peroxide oxidation were studied on passive iron in alkaline solutions of pH ranging from 9.8 to 13.8, using the rotating disk electrode. Measurements were taken using the linear sweep technique. The kinetic parameters of H2O2 oxidation were determined: the Tafel slope is 110 mV dec-1 and the reaction order with respect to H2O2 is 0.5 and with respect to the OH- ion 0.7. It is assumed that the rate determining step is the transfer of the first electron to the HO-2 ion adsorbed under Temkin conditions. The pH dependence of the reaction rate is attributed to the pH dependent properties of the passive iron surface. There are no indications for the semiconducting behaviour of the passive film. The rate of H2O2 chemical decomposition was estimated. It was found that the passive film on iron was a poor catalyst for H2O2 chemical decomposition.en
dc.publisherPergamon-Elsevier Science Ltd, Oxford
dc.rightsrestrictedAccess
dc.sourceElectrochimica Acta
dc.subjectelectrochemical oxidationen
dc.subjecthydrogen peroxideen
dc.subjectpassive ironen
dc.subjectrotating disk electrodeen
dc.titleHydrogen peroxide oxidation on passive iron in alkaline solutionsen
dc.typearticle
dc.rights.licenseARR
dc.citation.epage1850
dc.citation.issue10
dc.citation.other37(10): 1845-1850
dc.citation.rankM22
dc.citation.spage1845
dc.citation.volume37
dc.identifier.doi10.1016/0013-4686(92)85088-3
dc.identifier.pmid
dc.identifier.scopus2-s2.0-0026908111
dc.type.versionpublishedVersion


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Приказ основних података о документу