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dc.creatorKramar, Ana
dc.creatorAsanović, Koviljka
dc.creatorObradović, Bratislav M.
dc.creatorKuraica, Milorad M.
dc.creatorKostić, Mirjana
dc.date.accessioned2021-03-10T13:48:49Z
dc.date.available2021-03-10T13:48:49Z
dc.date.issued2018
dc.identifier.issn1229-9197
dc.identifier.urihttp://TechnoRep.tmf.bg.ac.rs/handle/123456789/3970
dc.description.abstractCellulose fabrics (viscose and cotton) were treated with atmospheric pressure dielectric barrier discharge (DBD) in air. After DBD treatment, samples were characterized and volume electrical resistance was measured under different relative humidity conditions (phi=40-55 %). Results have shown that DBD treatment increases wettability and polar surface functional groups content, which consequently causes a decrease of volume electrical resistivity of cellulose fabrics in measured relative humidity range (phi=40-55 %). Metal ions (silver, copper, and zinc) were incorporated in untreated and plasma treated samples through sorption from aqueous solutions and incorporation of metal ions into plasma treated cellulose samples decreased electrical resistivity even further. Resistivity of cotton and viscose fabrics with incorporated metal ions followed the order Zn2+ gt Cu2+ gt Ag+. The most pronounced decrease, for entire order of a magnitude, was obtained by modification of cotton fabric with DBD and silver ions, where value of resistivity dropped from G Omega to a several dozens of M Omega.en
dc.publisherKorean Fiber Soc, Seoul
dc.relationinfo:eu-repo/grantAgreement/MESTD/Basic Research (BR or ON)/172029/RS//
dc.relationinfo:eu-repo/grantAgreement/MESTD/Basic Research (BR or ON)/171034/RS//
dc.rightsrestrictedAccess
dc.sourceFibers and Polymers
dc.subjectCelluloseen
dc.subjectFabricsen
dc.subjectDielectric barrier discharge (DBD)en
dc.subjectElectrical resistivityen
dc.subjectMetal ionsen
dc.titleElectrical Resistivity of Plasma Treated Viscose and Cotton Fabrics with Incorporated Metal Ionsen
dc.typearticle
dc.rights.licenseARR
dc.citation.epage579
dc.citation.issue3
dc.citation.other19(3): 571-579
dc.citation.rankM21
dc.citation.spage571
dc.citation.volume19
dc.identifier.doi10.1007/s12221-018-7716-z
dc.identifier.scopus2-s2.0-85044383978
dc.identifier.wos000428281800011
dc.type.versionpublishedVersion


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