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dc.creatorSimović, Kornelija
dc.creatorMišković-Stanković, Vesna
dc.creatorKićević, Dušan
dc.creatorJovanić, P
dc.date.accessioned2021-03-10T10:01:02Z
dc.date.available2021-03-10T10:01:02Z
dc.date.issued2002
dc.identifier.issn0927-7757
dc.identifier.urihttp://TechnoRep.tmf.bg.ac.rs/handle/123456789/440
dc.description.abstractAlumina water suspensions have been prepared for thin alumina film deposition on steel. The type and quantity of deflocculant have been determined using zeta potential and viscosimetric measurements. The deposition was performed under the constant deposition voltage between 30 and 250 V. The morphology of electrodeposited alumina films was investigated using the optical microscopy coupled with image analysis, which enables the determination of pore number, percentage of film surface covered by pores and mean pore diameter, and scanning electron microscopy (SEM). It was shown that alumina films of the highest thickness and the lowest porosity can be formed at lower applied voltage and for longer deposition time. The minimum of alumina films porosity, obtained at the lowest deposition voltage of 30 V, can be explained by smaller amount of evolved hydrogen on the cathode during electrodeposition process.en
dc.publisherElsevier, Amsterdam
dc.rightsrestrictedAccess
dc.sourceColloids and Surfaces A-Physicochemical and Engineering Aspects
dc.subjectelectrodepositionen
dc.subjectalumina suspensionen
dc.subjectsteelen
dc.subjectimage analysisen
dc.subjectporosityen
dc.titleElectrophoretic deposition of thin alumina films from water suspensionen
dc.typearticle
dc.rights.licenseARR
dc.citation.epage55
dc.citation.issue1
dc.citation.other209(1): 47-55
dc.citation.rankM22
dc.citation.spage47
dc.citation.volume209
dc.identifier.doi10.1016/S0927-7757(02)00138-3
dc.identifier.scopus2-s2.0-0037019615
dc.identifier.wos000177577300005
dc.type.versionpublishedVersion


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