Bulk etching rate of LR115 detectors
Само за регистроване кориснике
2002
Чланак у часопису (Објављена верзија)
Метаподаци
Приказ свих података о документуАпстракт
The thickness of the layer of LR115 detector removed during etching was measured with a very precise instrument. Dependence of the bulk etch rate on temperature of the etching solution was investigated. It has been found that the etch rate is (3.27 +/- 0.08) mum/h at 60degreesC in 10%NaOH of water solution. It was also found that the track density in the detector irradiated to radon and its progeny increases linearly with the removed layer.
Кључне речи:
LR115 detector / bulk etch rate / form Talysurf / radon measurementsИзвор:
Applied Radiation and Isotopes, 2002, 57, 2, 275-278Издавач:
- Pergamon-Elsevier Science Ltd, Oxford
DOI: 10.1016/S0969-8043(02)00109-4
ISSN: 0969-8043
PubMed: 12150287
WoS: 000176423600018
Scopus: 2-s2.0-0036272909
Институција/група
Tehnološko-metalurški fakultetTY - JOUR AU - Nikezić, D AU - Janićijević, Aco PY - 2002 UR - http://TechnoRep.tmf.bg.ac.rs/handle/123456789/444 AB - The thickness of the layer of LR115 detector removed during etching was measured with a very precise instrument. Dependence of the bulk etch rate on temperature of the etching solution was investigated. It has been found that the etch rate is (3.27 +/- 0.08) mum/h at 60degreesC in 10%NaOH of water solution. It was also found that the track density in the detector irradiated to radon and its progeny increases linearly with the removed layer. PB - Pergamon-Elsevier Science Ltd, Oxford T2 - Applied Radiation and Isotopes T1 - Bulk etching rate of LR115 detectors EP - 278 IS - 2 SP - 275 VL - 57 DO - 10.1016/S0969-8043(02)00109-4 ER -
@article{ author = "Nikezić, D and Janićijević, Aco", year = "2002", abstract = "The thickness of the layer of LR115 detector removed during etching was measured with a very precise instrument. Dependence of the bulk etch rate on temperature of the etching solution was investigated. It has been found that the etch rate is (3.27 +/- 0.08) mum/h at 60degreesC in 10%NaOH of water solution. It was also found that the track density in the detector irradiated to radon and its progeny increases linearly with the removed layer.", publisher = "Pergamon-Elsevier Science Ltd, Oxford", journal = "Applied Radiation and Isotopes", title = "Bulk etching rate of LR115 detectors", pages = "278-275", number = "2", volume = "57", doi = "10.1016/S0969-8043(02)00109-4" }
Nikezić, D.,& Janićijević, A.. (2002). Bulk etching rate of LR115 detectors. in Applied Radiation and Isotopes Pergamon-Elsevier Science Ltd, Oxford., 57(2), 275-278. https://doi.org/10.1016/S0969-8043(02)00109-4
Nikezić D, Janićijević A. Bulk etching rate of LR115 detectors. in Applied Radiation and Isotopes. 2002;57(2):275-278. doi:10.1016/S0969-8043(02)00109-4 .
Nikezić, D, Janićijević, Aco, "Bulk etching rate of LR115 detectors" in Applied Radiation and Isotopes, 57, no. 2 (2002):275-278, https://doi.org/10.1016/S0969-8043(02)00109-4 . .