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Morphology, Structure and Mechanical Properties of Copper Coatings Electrodeposited by Pulsating Current (PC) Regime on Si(111)

Thumbnail
2020
4536.pdf (6.026Mb)
Authors
Mladenović, Ivana
Lamovec, Jelena
Vasiljević-Radović, Dana
Vasilić, Rastko
Radojević, Vesna
Nikolić, Nebojša
Article (Published version)
Metadata
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Abstract
Copper electrodeposition on (111)-oriented Si substrate was performed by the pulsating current (PC) regime at various average current densities in the range of 15-70 mAcm(-2), obtained by varying either the frequency (30, 50, 80 and 100 Hz for the current density amplitude of 100 mAcm(-2)) or the current density amplitude (120 and 140 mAcm(-2) at 100 Hz). The produced Cu coatings were examined by SEM, AFM and XRD techniques. The morphology of the coatings changed from those with large grains to fine-grained and globular, while the crystal structure changed from the strong (220) to the strong (111) preferred orientation by increasing the average current density. The mechanical characteristics of coatings were examined using Vickers micro-indentation tests, applying the Chicot-Lesage (C-L) composite hardness model for the analysis of microhardness. The maximum microhardness was obtained for the Cu coating produced at an average current density of 50 mAcm(-2), with a current density ampli...tude of 100 mAcm(-2) and a frequency of 100 Hz. This copper coating was fine-grained and showed the smallest roughness in relation to the other coatings, and it was obtained in the mixed activation-diffusion control between the end of the effect of the activation control and the beginning of the dominant effect of diffusion control.

Keywords:
copper / electrodeposition / the pulsating current (PC) regime / morphology / microstructure / composite hardness
Source:
Metals, 2020, 10, 4
Publisher:
  • MDPI, Basel
Funding / projects:
  • Ministry of Education, Science and Technological Development of the Republic of Serbia

DOI: 10.3390/met10040488

ISSN: 2075-4701

WoS: 000531826500067

Scopus: 2-s2.0-85083794768
[ Google Scholar ]
3
4
URI
http://TechnoRep.tmf.bg.ac.rs/handle/123456789/4539
Collections
  • Radovi istraživača / Researchers’ publications (TMF)
Institution/Community
Tehnološko-metalurški fakultet
TY  - JOUR
AU  - Mladenović, Ivana
AU  - Lamovec, Jelena
AU  - Vasiljević-Radović, Dana
AU  - Vasilić, Rastko
AU  - Radojević, Vesna
AU  - Nikolić, Nebojša
PY  - 2020
UR  - http://TechnoRep.tmf.bg.ac.rs/handle/123456789/4539
AB  - Copper electrodeposition on (111)-oriented Si substrate was performed by the pulsating current (PC) regime at various average current densities in the range of 15-70 mAcm(-2), obtained by varying either the frequency (30, 50, 80 and 100 Hz for the current density amplitude of 100 mAcm(-2)) or the current density amplitude (120 and 140 mAcm(-2) at 100 Hz). The produced Cu coatings were examined by SEM, AFM and XRD techniques. The morphology of the coatings changed from those with large grains to fine-grained and globular, while the crystal structure changed from the strong (220) to the strong (111) preferred orientation by increasing the average current density. The mechanical characteristics of coatings were examined using Vickers micro-indentation tests, applying the Chicot-Lesage (C-L) composite hardness model for the analysis of microhardness. The maximum microhardness was obtained for the Cu coating produced at an average current density of 50 mAcm(-2), with a current density amplitude of 100 mAcm(-2) and a frequency of 100 Hz. This copper coating was fine-grained and showed the smallest roughness in relation to the other coatings, and it was obtained in the mixed activation-diffusion control between the end of the effect of the activation control and the beginning of the dominant effect of diffusion control.
PB  - MDPI, Basel
T2  - Metals
T1  - Morphology, Structure and Mechanical Properties of Copper Coatings Electrodeposited by Pulsating Current (PC) Regime on Si(111)
IS  - 4
VL  - 10
DO  - 10.3390/met10040488
UR  - conv_6110
ER  - 
@article{
author = "Mladenović, Ivana and Lamovec, Jelena and Vasiljević-Radović, Dana and Vasilić, Rastko and Radojević, Vesna and Nikolić, Nebojša",
year = "2020",
abstract = "Copper electrodeposition on (111)-oriented Si substrate was performed by the pulsating current (PC) regime at various average current densities in the range of 15-70 mAcm(-2), obtained by varying either the frequency (30, 50, 80 and 100 Hz for the current density amplitude of 100 mAcm(-2)) or the current density amplitude (120 and 140 mAcm(-2) at 100 Hz). The produced Cu coatings were examined by SEM, AFM and XRD techniques. The morphology of the coatings changed from those with large grains to fine-grained and globular, while the crystal structure changed from the strong (220) to the strong (111) preferred orientation by increasing the average current density. The mechanical characteristics of coatings were examined using Vickers micro-indentation tests, applying the Chicot-Lesage (C-L) composite hardness model for the analysis of microhardness. The maximum microhardness was obtained for the Cu coating produced at an average current density of 50 mAcm(-2), with a current density amplitude of 100 mAcm(-2) and a frequency of 100 Hz. This copper coating was fine-grained and showed the smallest roughness in relation to the other coatings, and it was obtained in the mixed activation-diffusion control between the end of the effect of the activation control and the beginning of the dominant effect of diffusion control.",
publisher = "MDPI, Basel",
journal = "Metals",
title = "Morphology, Structure and Mechanical Properties of Copper Coatings Electrodeposited by Pulsating Current (PC) Regime on Si(111)",
number = "4",
volume = "10",
doi = "10.3390/met10040488",
url = "conv_6110"
}
Mladenović, I., Lamovec, J., Vasiljević-Radović, D., Vasilić, R., Radojević, V.,& Nikolić, N.. (2020). Morphology, Structure and Mechanical Properties of Copper Coatings Electrodeposited by Pulsating Current (PC) Regime on Si(111). in Metals
MDPI, Basel., 10(4).
https://doi.org/10.3390/met10040488
conv_6110
Mladenović I, Lamovec J, Vasiljević-Radović D, Vasilić R, Radojević V, Nikolić N. Morphology, Structure and Mechanical Properties of Copper Coatings Electrodeposited by Pulsating Current (PC) Regime on Si(111). in Metals. 2020;10(4).
doi:10.3390/met10040488
conv_6110 .
Mladenović, Ivana, Lamovec, Jelena, Vasiljević-Radović, Dana, Vasilić, Rastko, Radojević, Vesna, Nikolić, Nebojša, "Morphology, Structure and Mechanical Properties of Copper Coatings Electrodeposited by Pulsating Current (PC) Regime on Si(111)" in Metals, 10, no. 4 (2020),
https://doi.org/10.3390/met10040488 .,
conv_6110 .

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