The photopolymerisation of methacrylic acid by colloidal semiconductors

dc.creator	Popović, Ivanka
dc.creator	Katsikas, Lynne
dc.creator	Weller, Horst
dc.date.accessioned	2021-03-10T09:36:20Z
dc.date.available	2021-03-10T09:36:20Z
dc.date.issued	1994
dc.identifier.issn	0170-0839
dc.identifier.uri	http://TechnoRep.tmf.bg.ac.rs/handle/123456789/57
dc.description.abstract	Methacrylic acid was photopolymerised using CdS and composite, CdS/HgS and CdS/TiO2, colloidal semiconductor particles as initiators. The previously proposed photoinitiation mechanism involving the photogenerated positive hole in the valence band of the CdS colloid was confirmed by the electron scavenging action of TiO2. The effect of pH on the course of the polymerisation was investigated and is discussed.	en
dc.publisher	Springer, New York
dc.rights	restrictedAccess
dc.source	Polymer Bulletin
dc.title	The photopolymerisation of methacrylic acid by colloidal semiconductors	en
dc.type	article
dc.rights.license	ARR
dc.citation.epage	603
dc.citation.issue	5-6
dc.citation.other	32(5-6): 597-603
dc.citation.spage	597
dc.citation.volume	32
dc.identifier.doi	10.1007/BF00973907
dc.identifier.pmid
dc.identifier.scopus	2-s2.0-0028441520
dc.type.version	publishedVersion