Photocatalytic activity of pulsed laser deposited TiO2 thin films in N-2, O-2 and CH4
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2010
Authors
Socol, GabrielGnatyuk, Yu.
Stefan, Nicolaie
Smirnova, Natalia
Đokić, Veljko
Sutan, Claudiu
Malinovschi, Viorel
Stanculescu, A.
Korduban, Oleksandr
Mihailescu, Ion N.
Article (Published version)
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Show full item recordAbstract
We report on pulsed laser deposition of TiO2 films on glass substrates in oxygen, methane, nitrogen and mixture of oxygen and nitrogen atmosphere. The nitrogen incorporation into TiO2 lattice was successfully achieved, as demonstrated by optical absorption and XPS measurements. The absorption edge of the N-doped TiO2 films was red-shifted up to similar to 480 nm from 360 nm in case of undoped ones. The photocatalytic activity of TiO2 films was investigated during toxic Cr(VI) ions photoreduction to Cr(III) state in aqueous media under irradiation with visible and UV light. Under visible light irradiation, TiO2 films deposited in nitrogen atmosphere showed the highest photocatalytic activity, whereas by UV light exposure the best results were obtained for the TiO2 structures deposited in pure methane and oxygen atmosphere.
Keywords:
Photocatalytic activity / N and C doped TiO2 thin films Photoreduction of toxic Cr (VI) ions Pulsed laser depositionSource:
Thin Solid Films, 2010, 518, 16, 4648-4653Publisher:
- Elsevier Science Sa, Lausanne
DOI: 10.1016/j.tsf.2009.12.051
ISSN: 0040-6090
WoS: 000279377600040
Scopus: 2-s2.0-77955623478
Institution/Community
Inovacioni centarTY - JOUR AU - Socol, Gabriel AU - Gnatyuk, Yu. AU - Stefan, Nicolaie AU - Smirnova, Natalia AU - Đokić, Veljko AU - Sutan, Claudiu AU - Malinovschi, Viorel AU - Stanculescu, A. AU - Korduban, Oleksandr AU - Mihailescu, Ion N. PY - 2010 UR - http://TechnoRep.tmf.bg.ac.rs/handle/123456789/1585 AB - We report on pulsed laser deposition of TiO2 films on glass substrates in oxygen, methane, nitrogen and mixture of oxygen and nitrogen atmosphere. The nitrogen incorporation into TiO2 lattice was successfully achieved, as demonstrated by optical absorption and XPS measurements. The absorption edge of the N-doped TiO2 films was red-shifted up to similar to 480 nm from 360 nm in case of undoped ones. The photocatalytic activity of TiO2 films was investigated during toxic Cr(VI) ions photoreduction to Cr(III) state in aqueous media under irradiation with visible and UV light. Under visible light irradiation, TiO2 films deposited in nitrogen atmosphere showed the highest photocatalytic activity, whereas by UV light exposure the best results were obtained for the TiO2 structures deposited in pure methane and oxygen atmosphere. PB - Elsevier Science Sa, Lausanne T2 - Thin Solid Films T1 - Photocatalytic activity of pulsed laser deposited TiO2 thin films in N-2, O-2 and CH4 EP - 4653 IS - 16 SP - 4648 VL - 518 DO - 10.1016/j.tsf.2009.12.051 ER -
@article{ author = "Socol, Gabriel and Gnatyuk, Yu. and Stefan, Nicolaie and Smirnova, Natalia and Đokić, Veljko and Sutan, Claudiu and Malinovschi, Viorel and Stanculescu, A. and Korduban, Oleksandr and Mihailescu, Ion N.", year = "2010", abstract = "We report on pulsed laser deposition of TiO2 films on glass substrates in oxygen, methane, nitrogen and mixture of oxygen and nitrogen atmosphere. The nitrogen incorporation into TiO2 lattice was successfully achieved, as demonstrated by optical absorption and XPS measurements. The absorption edge of the N-doped TiO2 films was red-shifted up to similar to 480 nm from 360 nm in case of undoped ones. The photocatalytic activity of TiO2 films was investigated during toxic Cr(VI) ions photoreduction to Cr(III) state in aqueous media under irradiation with visible and UV light. Under visible light irradiation, TiO2 films deposited in nitrogen atmosphere showed the highest photocatalytic activity, whereas by UV light exposure the best results were obtained for the TiO2 structures deposited in pure methane and oxygen atmosphere.", publisher = "Elsevier Science Sa, Lausanne", journal = "Thin Solid Films", title = "Photocatalytic activity of pulsed laser deposited TiO2 thin films in N-2, O-2 and CH4", pages = "4653-4648", number = "16", volume = "518", doi = "10.1016/j.tsf.2009.12.051" }
Socol, G., Gnatyuk, Yu., Stefan, N., Smirnova, N., Đokić, V., Sutan, C., Malinovschi, V., Stanculescu, A., Korduban, O.,& Mihailescu, I. N.. (2010). Photocatalytic activity of pulsed laser deposited TiO2 thin films in N-2, O-2 and CH4. in Thin Solid Films Elsevier Science Sa, Lausanne., 518(16), 4648-4653. https://doi.org/10.1016/j.tsf.2009.12.051
Socol G, Gnatyuk Y, Stefan N, Smirnova N, Đokić V, Sutan C, Malinovschi V, Stanculescu A, Korduban O, Mihailescu IN. Photocatalytic activity of pulsed laser deposited TiO2 thin films in N-2, O-2 and CH4. in Thin Solid Films. 2010;518(16):4648-4653. doi:10.1016/j.tsf.2009.12.051 .
Socol, Gabriel, Gnatyuk, Yu., Stefan, Nicolaie, Smirnova, Natalia, Đokić, Veljko, Sutan, Claudiu, Malinovschi, Viorel, Stanculescu, A., Korduban, Oleksandr, Mihailescu, Ion N., "Photocatalytic activity of pulsed laser deposited TiO2 thin films in N-2, O-2 and CH4" in Thin Solid Films, 518, no. 16 (2010):4648-4653, https://doi.org/10.1016/j.tsf.2009.12.051 . .