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dc.creatorPopov, Konstantin I.
dc.creatorGrgur, Branimir
dc.creatorStojilković, E.R.
dc.creatorPavlović, Miomir G.
dc.creatorNikolić, N.D.
dc.date.accessioned2021-03-10T09:39:40Z
dc.date.available2021-03-10T09:39:40Z
dc.date.issued1997
dc.identifier.issn0352-5139
dc.identifier.urihttp://TechnoRep.tmf.bg.ac.rs/handle/123456789/110
dc.description.abstractThe initial stage of thin surface metal film formation on inert substrate is considered. The simultaneous action of both active centers and nucleation exclusion zones was taken into consideration when discussing the saturation nucleus density. The saturation nucleus density increases with increasing number of active centers and decreasing the radii of nucleation exclusion zones (enhancing the thin metal film formation). At one at the same deposition current density deposition overpotential increases with decreasing deposition process exchange current density, leading to the increase in the number of active centers and to decrease of crystallization overpotential and radii of nucleation exclusion zones. Because of this compact surface metal film will be formed at a lower quantity of electrodeposited metal with a decrease in exchange current density.en
dc.publisherSerbian Chemical Society, Belgrade
dc.rightsopenAccess
dc.rights.urihttps://creativecommons.org/licenses/by-nc-nd/4.0/
dc.sourceJournal of the Serbian Chemical Society
dc.subjectMetal electrodepositionen
dc.subjectSurface metal film formationen
dc.subjectThin metal film formationen
dc.titleThe effect of deposition process exchange current density on the thin metal film formation on inert substrateen
dc.typearticle
dc.rights.licenseBY-NC-ND
dc.citation.epage442
dc.citation.issue5
dc.citation.other62(5): 433-442
dc.citation.spage433
dc.citation.volume62
dc.identifier.pmid
dc.identifier.rcubconv_7298
dc.identifier.scopus2-s2.0-0031521623
dc.type.versionpublishedVersion


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