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dc.creatorAbood, Imhammad
dc.creatorLukić, Petar M.
dc.creatorŠašić, Rajko
dc.creatorAlkoash, Abed Alkhem
dc.creatorOstojić, Stanko M.
dc.date.accessioned2021-03-10T12:08:47Z
dc.date.available2021-03-10T12:08:47Z
dc.date.issued2013
dc.identifier.issn1842-6573
dc.identifier.urihttp://TechnoRep.tmf.bg.ac.rs/handle/123456789/2417
dc.description.abstract4H-SiC VDMOS is a peculiar semiconductor structure with two considerably different recognized regions. One of them is a vertical drift region, whereas the other one appears as a horizontal channel with its left and right sections corresponding to source bias. In each of these regions current-voltage characterisic can become saturated regardless of the status of the other region, thus making possible several operation modes of the considered devices. The investigation of the onset of these saturations in their order of appearance is the goal of this paper.en
dc.publisherNatl Inst Optoelectronics, Bucharest-Magurele
dc.relationinfo:eu-repo/grantAgreement/MESTD/Integrated and Interdisciplinary Research (IIR or III)/45003/RS//
dc.rightsrestrictedAccess
dc.sourceOptoelectronics and Advanced Materials-Rapid Communications
dc.subject4H-SiC VDMOSen
dc.subjectDrift-region saturationen
dc.subjectChannel saturationen
dc.title4H-SiC VDMOS - drift-region saturation, channel saturation and their order of appearanceen
dc.typearticle
dc.rights.licenseARR
dc.citation.epage333
dc.citation.issue5-6
dc.citation.other7(5-6): 329-333
dc.citation.rankM23
dc.citation.spage329
dc.citation.volume7
dc.identifier.rcubhttps://hdl.handle.net/21.15107/rcub_technorep_2417
dc.identifier.wos000322287800003
dc.type.versionpublishedVersion


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