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The improved photooxidation stability of the SILAR deposited copper sulfide on polypyrrole

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2015
Authors
Janačković, Marija
Gvozdenović, Milica
Jugović, Branimir
Grgur, Branimir
article (publishedVersion)
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Abstract
The copper sulfide is successfully deposited onto electrochemically formed polypyrrole, by successive ion-adsorption and reaction (SILAR) processes. The photoelectrochemical behavior of the polypyrrole, copper sulfide and copper sulfide modified polypyrrole are investigated in the sulfide based solution, under cathodic and anodic polarization. The improvement of the photooxidation stability, as well as activity of copper sulfide modified polypyrrole is achieved. Such behavior is explained by recombination of electrons from Cu2-xS conducting band with the holes of the PPy LUMO.
Keywords:
Photocorrosion / Sulfide / Thiourea / Oxidation / Band gap
Source:
Synthetic Metals, 2015, 203, 37-43
Publisher:
  • Elsevier Science Sa, Lausanne
Funding / projects:
  • info:eu-repo/grantAgreement/MESTD/Basic Research (BR or ON)/172046/RS// (RS-172046)

DOI: 10.1016/j.synthmet.2015.02.011

ISSN: 0379-6779

WoS: 000353097600006

Scopus: 2-s2.0-84923241488
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URI
http://TechnoRep.tmf.bg.ac.rs/handle/123456789/2965
Collections
  • Radovi istraživača / Researchers’ publications (TMF)
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Tehnološko-metalurški fakultet

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