Приказ основних података о документу

dc.creatorJanačković, Marija
dc.creatorGvozdenović, Milica
dc.creatorJugović, Branimir
dc.creatorGrgur, Branimir
dc.date.accessioned2021-03-10T12:43:32Z
dc.date.available2021-03-10T12:43:32Z
dc.date.issued2015
dc.identifier.issn0379-6779
dc.identifier.urihttp://TechnoRep.tmf.bg.ac.rs/handle/123456789/2965
dc.description.abstractThe copper sulfide is successfully deposited onto electrochemically formed polypyrrole, by successive ion-adsorption and reaction (SILAR) processes. The photoelectrochemical behavior of the polypyrrole, copper sulfide and copper sulfide modified polypyrrole are investigated in the sulfide based solution, under cathodic and anodic polarization. The improvement of the photooxidation stability, as well as activity of copper sulfide modified polypyrrole is achieved. Such behavior is explained by recombination of electrons from Cu2-xS conducting band with the holes of the PPy LUMO.en
dc.publisherElsevier Science Sa, Lausanne
dc.relationinfo:eu-repo/grantAgreement/MESTD/Basic Research (BR or ON)/172046/RS//
dc.rightsrestrictedAccess
dc.sourceSynthetic Metals
dc.subjectPhotocorrosionen
dc.subjectSulfideen
dc.subjectThioureaen
dc.subjectOxidationen
dc.subjectBand gapen
dc.titleThe improved photooxidation stability of the SILAR deposited copper sulfide on polypyrroleen
dc.typearticle
dc.rights.licenseARR
dc.citation.epage43
dc.citation.other203: 37-43
dc.citation.rankM22
dc.citation.spage37
dc.citation.volume203
dc.identifier.doi10.1016/j.synthmet.2015.02.011
dc.identifier.scopus2-s2.0-84923241488
dc.identifier.wos000353097600006
dc.type.versionpublishedVersion


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