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dc.creatorJovicević, Niko
dc.creatorCvetković, Vesna S.
dc.creatorKamberović, Željko
dc.creatorBarudžija, Tanja
dc.date.accessioned2021-03-10T12:51:55Z
dc.date.available2021-03-10T12:51:55Z
dc.date.issued2015
dc.identifier.issn1452-3981
dc.identifier.urihttp://TechnoRep.tmf.bg.ac.rs/handle/123456789/3094
dc.description.abstractAim of this work was to study underpotential deposition of aluminium onto polycrystalline vanadium electrode from equimolar AlCl3+NaCl melt at 473, 523 and 573 K. It was found that aluminium was deposited and incorporated into polycrystalline vanadium electrode at potentials more positive than the Al reverse potential. Applied electrochemical techniques: linear sweep voltammetry and potentiostatic deposition/ galvanostatic striping, showed clear evidence of formation of three intermetallic compounds whose presence depends on temperature and applied deposition time. Deposits were studied via scanning electron microscopy (SEM), energy dispersive spectrometry and X-ray spectroscopy (EDS and EDX), atomic force microscopy (AFM) and X-ray diffraction (XRD).en
dc.publisherElectrochemical Science Group, Beograd
dc.relationinfo:eu-repo/grantAgreement/MESTD/Basic Research (BR or ON)/176020/RS//
dc.rightsrestrictedAccess
dc.sourceInternational Journal of Electrochemical Science
dc.subjectAluminium-Vanadium alloysen
dc.subjectChloroaluminate meltsen
dc.subjectUnderpotential depositionen
dc.subjectMicroscopy and microanalysis techniquesen
dc.titleAluminium Underpotential Deposition from AlCl3+NaCl Melts and Alloy Formation with Vanadium Substrateen
dc.typearticle
dc.rights.licenseARR
dc.citation.epage8972
dc.citation.issue11
dc.citation.other10(11): 8959-8972
dc.citation.rankM23
dc.citation.spage8959
dc.citation.volume10
dc.identifier.rcubhttps://hdl.handle.net/21.15107/rcub_vinar_848
dc.identifier.scopus2-s2.0-84953263496
dc.identifier.wos000366177700013
dc.type.versionpublishedVersion


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Приказ основних података о документу