Bulk etching rate of LR115 detectors
Authorized Users Only
MetadataShow full item record
The thickness of the layer of LR115 detector removed during etching was measured with a very precise instrument. Dependence of the bulk etch rate on temperature of the etching solution was investigated. It has been found that the etch rate is (3.27 +/- 0.08) mum/h at 60degreesC in 10%NaOH of water solution. It was also found that the track density in the detector irradiated to radon and its progeny increases linearly with the removed layer.
Keywords:LR115 detector / bulk etch rate / form Talysurf / radon measurements
Source:Applied Radiation and Isotopes, 2002, 57, 2, 275-278
- Pergamon-Elsevier Science Ltd, Oxford