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Morphologies of copper deposits obtained by the electrodeposition at high overpotentials

Authorized Users Only
2006
Authors
Nikolić, Nebojša D.
Popov, Konstantin I.
Pavlović, Ljubica J.
Pavlović, Miomir
Article (Published version)
Metadata
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Abstract
Morphologies of copper deposits obtained at overpotentials belonging to the plateau of the limiting diffusion current density and at higheroverpotentials were examined by the scanning electron microscopy (SEM) technique. Copper dendrites are formed at overpotentials belonging tothe plateau of the limiting diffusion current density. The shape of copper dendrites depends on the electrodeposition overpotential. At higheroverpotentials (800 and 1000 mV) and larger values of current densities, porous and very disperse copper deposits were obtained. Thesemorphologies were a consequence of a very vigorous hydrogen evolution at these electrodeposition overpotentials. Also, the obtained copperstructures consisted of agglomerates of copper grains. The size of copper grains is a function of the overpotential of electrodeposition, thusapproaching to nano-sized dimensions is achieved when the electrodeposition overpotential is increased.
Keywords:
Electroplating / Scanning electron microscopy (SEM) / Copper / The hydrogen evolution
Source:
Surface and Coatings Technology, 2006, 201, 3-4, 560-566
Publisher:
  • Elsevier

DOI: 10.1016/j.surfcoat.2005.12.004

ISSN: 0257-8972

WoS: 000244477300008

Scopus: 2-s2.0-33748414039
[ Google Scholar ]
146
134
URI
http://TechnoRep.tmf.bg.ac.rs/handle/123456789/5447
Collections
  • Radovi istraživača / Researchers’ publications (TMF)
Institution/Community
Tehnološko-metalurški fakultet
TY  - JOUR
AU  - Nikolić, Nebojša D.
AU  - Popov, Konstantin I.
AU  - Pavlović, Ljubica J.
AU  - Pavlović, Miomir
PY  - 2006
UR  - http://TechnoRep.tmf.bg.ac.rs/handle/123456789/5447
AB  - Morphologies of copper deposits obtained at overpotentials belonging to the plateau of the limiting diffusion current density and at higheroverpotentials were examined by the scanning electron microscopy (SEM) technique. Copper dendrites are formed at overpotentials belonging tothe plateau of the limiting diffusion current density. The shape of copper dendrites depends on the electrodeposition overpotential. At higheroverpotentials (800 and 1000 mV) and larger values of current densities, porous and very disperse copper deposits were obtained. Thesemorphologies were a consequence of a very vigorous hydrogen evolution at these electrodeposition overpotentials. Also, the obtained copperstructures consisted of agglomerates of copper grains. The size of copper grains is a function of the overpotential of electrodeposition, thusapproaching to nano-sized dimensions is achieved when the electrodeposition overpotential is increased.
PB  - Elsevier
T2  - Surface and Coatings Technology
T1  - Morphologies of copper deposits obtained by the electrodeposition at high overpotentials
EP  - 566
IS  - 3-4
SP  - 560
VL  - 201
DO  - 10.1016/j.surfcoat.2005.12.004
ER  - 
@article{
author = "Nikolić, Nebojša D. and Popov, Konstantin I. and Pavlović, Ljubica J. and Pavlović, Miomir",
year = "2006",
abstract = "Morphologies of copper deposits obtained at overpotentials belonging to the plateau of the limiting diffusion current density and at higheroverpotentials were examined by the scanning electron microscopy (SEM) technique. Copper dendrites are formed at overpotentials belonging tothe plateau of the limiting diffusion current density. The shape of copper dendrites depends on the electrodeposition overpotential. At higheroverpotentials (800 and 1000 mV) and larger values of current densities, porous and very disperse copper deposits were obtained. Thesemorphologies were a consequence of a very vigorous hydrogen evolution at these electrodeposition overpotentials. Also, the obtained copperstructures consisted of agglomerates of copper grains. The size of copper grains is a function of the overpotential of electrodeposition, thusapproaching to nano-sized dimensions is achieved when the electrodeposition overpotential is increased.",
publisher = "Elsevier",
journal = "Surface and Coatings Technology",
title = "Morphologies of copper deposits obtained by the electrodeposition at high overpotentials",
pages = "566-560",
number = "3-4",
volume = "201",
doi = "10.1016/j.surfcoat.2005.12.004"
}
Nikolić, N. D., Popov, K. I., Pavlović, L. J.,& Pavlović, M.. (2006). Morphologies of copper deposits obtained by the electrodeposition at high overpotentials. in Surface and Coatings Technology
Elsevier., 201(3-4), 560-566.
https://doi.org/10.1016/j.surfcoat.2005.12.004
Nikolić ND, Popov KI, Pavlović LJ, Pavlović M. Morphologies of copper deposits obtained by the electrodeposition at high overpotentials. in Surface and Coatings Technology. 2006;201(3-4):560-566.
doi:10.1016/j.surfcoat.2005.12.004 .
Nikolić, Nebojša D., Popov, Konstantin I., Pavlović, Ljubica J., Pavlović, Miomir, "Morphologies of copper deposits obtained by the electrodeposition at high overpotentials" in Surface and Coatings Technology, 201, no. 3-4 (2006):560-566,
https://doi.org/10.1016/j.surfcoat.2005.12.004 . .

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