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The photopolymerisation of methacrylic acid by colloidal semiconductors

Authorized Users Only
1994
Authors
Popović, Ivanka
Katsikas, Lynne
Weller, Horst
Article (Published version)
Metadata
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Abstract
Methacrylic acid was photopolymerised using CdS and composite, CdS/HgS and CdS/TiO2, colloidal semiconductor particles as initiators. The previously proposed photoinitiation mechanism involving the photogenerated positive hole in the valence band of the CdS colloid was confirmed by the electron scavenging action of TiO2. The effect of pH on the course of the polymerisation was investigated and is discussed.
Source:
Polymer Bulletin, 1994, 32, 5-6, 597-603
Publisher:
  • Springer, New York

DOI: 10.1007/BF00973907

ISSN: 0170-0839

PubMed:

Scopus: 2-s2.0-0028441520
[ Google Scholar ]
27
URI
http://TechnoRep.tmf.bg.ac.rs/handle/123456789/57
Collections
  • Radovi istraživača / Researchers’ publications (TMF)
Institution/Community
Tehnološko-metalurški fakultet
TY  - JOUR
AU  - Popović, Ivanka
AU  - Katsikas, Lynne
AU  - Weller, Horst
PY  - 1994
UR  - http://TechnoRep.tmf.bg.ac.rs/handle/123456789/57
AB  - Methacrylic acid was photopolymerised using CdS and composite, CdS/HgS and CdS/TiO2, colloidal semiconductor particles as initiators. The previously proposed photoinitiation mechanism involving the photogenerated positive hole in the valence band of the CdS colloid was confirmed by the electron scavenging action of TiO2. The effect of pH on the course of the polymerisation was investigated and is discussed.
PB  - Springer, New York
T2  - Polymer Bulletin
T1  - The photopolymerisation of methacrylic acid by colloidal semiconductors
EP  - 603
IS  - 5-6
SP  - 597
VL  - 32
DO  - 10.1007/BF00973907
ER  - 
@article{
author = "Popović, Ivanka and Katsikas, Lynne and Weller, Horst",
year = "1994",
abstract = "Methacrylic acid was photopolymerised using CdS and composite, CdS/HgS and CdS/TiO2, colloidal semiconductor particles as initiators. The previously proposed photoinitiation mechanism involving the photogenerated positive hole in the valence band of the CdS colloid was confirmed by the electron scavenging action of TiO2. The effect of pH on the course of the polymerisation was investigated and is discussed.",
publisher = "Springer, New York",
journal = "Polymer Bulletin",
title = "The photopolymerisation of methacrylic acid by colloidal semiconductors",
pages = "603-597",
number = "5-6",
volume = "32",
doi = "10.1007/BF00973907"
}
Popović, I., Katsikas, L.,& Weller, H.. (1994). The photopolymerisation of methacrylic acid by colloidal semiconductors. in Polymer Bulletin
Springer, New York., 32(5-6), 597-603.
https://doi.org/10.1007/BF00973907
Popović I, Katsikas L, Weller H. The photopolymerisation of methacrylic acid by colloidal semiconductors. in Polymer Bulletin. 1994;32(5-6):597-603.
doi:10.1007/BF00973907 .
Popović, Ivanka, Katsikas, Lynne, Weller, Horst, "The photopolymerisation of methacrylic acid by colloidal semiconductors" in Polymer Bulletin, 32, no. 5-6 (1994):597-603,
https://doi.org/10.1007/BF00973907 . .

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