TY  - JOUR
AU  - Modrić-Šahbazović, Almedina
AU  - Novaković, Mirjana M.
AU  - Schmidt, Emanuel O.
AU  - Gazdić, Izet
AU  - Đokić, Veljko
AU  - Peruško, Davor
AU  - Bibić, Nataša M.
AU  - Ronning, Carsten
AU  - Rakočević, Zlatko Lj.
PY  - 2019
UR  - http://TechnoRep.tmf.bg.ac.rs/handle/123456789/4160
AB  - Nanosphere lithography is an effective technique for high throughput fabrication of well-ordered patterns on large areas. This study reports on nanostructuring of silicon samples by means of Ag ions implantation through self-organized polystyrene (PS) masks. The PS nanospheres with a diameter of similar to 150 nm were self-assembled in a hexagonal array on top of Si(100) wafers, and then used as a mask for subsequent 60 keV silver ion implantation. Different fluences were applied up to 2 x 10(16) ions/cm(2) in order to create a distribution of different sizes and densities of buried metal nanoparticles. The surface morphology and the subsurface structures were studied by scanning electron microscopy and cross-sectional transmission electron microscopy, as a function of the mask deformation upon irradiation and the implantation parameters itself. We demonstrate that Ag is implanted into Si only through the mask openings, thus forming a regular array of amorphized regions over the wide area of silicon substrate. These fragments are of similar dimensions of the spheres with widths of about 190 nm and distributed over 60 nm in depth due to the given ion range. At the subsurface region of the implanted fragments, the synthesis of small sized and optically active Ag nanoparticles is clearly observed. The samples show a strong absorption peak in the long-wavelength region from 689 to 745 nm characteristic for surface plasmon resonance excitations, which could be fitted well using the Maxwell-Garnett's theory.
PB  - Elsevier Science Bv, Amsterdam
T2  - Optical Materials
T1  - Silicon nanostructuring by Ag ions implantation through nanosphere lithography mask
EP  - 515
SP  - 508
VL  - 88
DO  - 10.1016/j.optmat.2018.12.022
ER  - 

@article{
author = "Modrić-Šahbazović, Almedina and Novaković, Mirjana M. and Schmidt, Emanuel O. and Gazdić, Izet and Đokić, Veljko and Peruško, Davor and Bibić, Nataša M. and Ronning, Carsten and Rakočević, Zlatko Lj.",
year = "2019",
abstract = "Nanosphere lithography is an effective technique for high throughput fabrication of well-ordered patterns on large areas. This study reports on nanostructuring of silicon samples by means of Ag ions implantation through self-organized polystyrene (PS) masks. The PS nanospheres with a diameter of similar to 150 nm were self-assembled in a hexagonal array on top of Si(100) wafers, and then used as a mask for subsequent 60 keV silver ion implantation. Different fluences were applied up to 2 x 10(16) ions/cm(2) in order to create a distribution of different sizes and densities of buried metal nanoparticles. The surface morphology and the subsurface structures were studied by scanning electron microscopy and cross-sectional transmission electron microscopy, as a function of the mask deformation upon irradiation and the implantation parameters itself. We demonstrate that Ag is implanted into Si only through the mask openings, thus forming a regular array of amorphized regions over the wide area of silicon substrate. These fragments are of similar dimensions of the spheres with widths of about 190 nm and distributed over 60 nm in depth due to the given ion range. At the subsurface region of the implanted fragments, the synthesis of small sized and optically active Ag nanoparticles is clearly observed. The samples show a strong absorption peak in the long-wavelength region from 689 to 745 nm characteristic for surface plasmon resonance excitations, which could be fitted well using the Maxwell-Garnett's theory.",
publisher = "Elsevier Science Bv, Amsterdam",
journal = "Optical Materials",
title = "Silicon nanostructuring by Ag ions implantation through nanosphere lithography mask",
pages = "515-508",
volume = "88",
doi = "10.1016/j.optmat.2018.12.022"
}

Modrić-Šahbazović, A., Novaković, M. M., Schmidt, E. O., Gazdić, I., Đokić, V., Peruško, D., Bibić, N. M., Ronning, C.,& Rakočević, Z. Lj.. (2019). Silicon nanostructuring by Ag ions implantation through nanosphere lithography mask. in Optical Materials
Elsevier Science Bv, Amsterdam., 88, 508-515.
https://doi.org/10.1016/j.optmat.2018.12.022

Modrić-Šahbazović A, Novaković MM, Schmidt EO, Gazdić I, Đokić V, Peruško D, Bibić NM, Ronning C, Rakočević ZL. Silicon nanostructuring by Ag ions implantation through nanosphere lithography mask. in Optical Materials. 2019;88:508-515.
doi:10.1016/j.optmat.2018.12.022 .

Modrić-Šahbazović, Almedina, Novaković, Mirjana M., Schmidt, Emanuel O., Gazdić, Izet, Đokić, Veljko, Peruško, Davor, Bibić, Nataša M., Ronning, Carsten, Rakočević, Zlatko Lj., "Silicon nanostructuring by Ag ions implantation through nanosphere lithography mask" in Optical Materials, 88 (2019):508-515,
https://doi.org/10.1016/j.optmat.2018.12.022 . .

TY  - JOUR
AU  - Modrić-Šahbazović, Almedina
AU  - Novaković, Mirjana M.
AU  - Đokić, Veljko
AU  - Gazdić, Izet
AU  - Bibić, Nataša M.
AU  - Rakočević, Zlatko Lj.
PY  - 2018
UR  - http://TechnoRep.tmf.bg.ac.rs/handle/123456789/3920
AB  - The self-assembly methods, an inexpensive and high throughput technique capable of producing nanostructure arrays, relies on the formation on a monolayer of self-assembled nanospheres. This paper reports on the formation of large-areas monolayer polystyrene particles similar to 150 nm in diameter onto monocrystalline Si (100) substrates by using the spin-coating method. In this method, the quality of the deposited monolayer is determined by the balance between spinning and solvent evaporation, accounted by two different forces, the centrifugal force and viscous shearing force, and their interplay. The key process parameters which influence the deposition process and determine the properties of polystyrene monolayers such as the spinning rate, time and concentration of PS particles in the solution were studied. By varying the experimental conditions in different steps the films quality can be easily improved and the optimized experimental parameters were achieved. A homogenous and well-ordered PS monolayer with a high surface coverage of similar to 94 % was formed on a large-area substrate of 1 cm x1 cm at specific conditions of a 2000 rpm spinning rate, 2 wt. % polystyrene solution concentration and 210 s duration of the spinning process. We conclude that this method can be useful in a variety of applications since it offers a stable and controllable approach to the fabrication of monolayer polystyrene films on a large-scale.
PB  - Univerzitet u Beogradu - Institut za nuklearne nauke Vinča, Beograd
T2  - Nuclear Technology & Radiation Protection
T1  - Formation of a large-area monolayer of polystyrene film via the spin-coating method
EP  - 251
IS  - 3
SP  - 246
VL  - 33
DO  - 10.2298/NTRP1803246M
ER  - 

@article{
author = "Modrić-Šahbazović, Almedina and Novaković, Mirjana M. and Đokić, Veljko and Gazdić, Izet and Bibić, Nataša M. and Rakočević, Zlatko Lj.",
year = "2018",
abstract = "The self-assembly methods, an inexpensive and high throughput technique capable of producing nanostructure arrays, relies on the formation on a monolayer of self-assembled nanospheres. This paper reports on the formation of large-areas monolayer polystyrene particles similar to 150 nm in diameter onto monocrystalline Si (100) substrates by using the spin-coating method. In this method, the quality of the deposited monolayer is determined by the balance between spinning and solvent evaporation, accounted by two different forces, the centrifugal force and viscous shearing force, and their interplay. The key process parameters which influence the deposition process and determine the properties of polystyrene monolayers such as the spinning rate, time and concentration of PS particles in the solution were studied. By varying the experimental conditions in different steps the films quality can be easily improved and the optimized experimental parameters were achieved. A homogenous and well-ordered PS monolayer with a high surface coverage of similar to 94 % was formed on a large-area substrate of 1 cm x1 cm at specific conditions of a 2000 rpm spinning rate, 2 wt. % polystyrene solution concentration and 210 s duration of the spinning process. We conclude that this method can be useful in a variety of applications since it offers a stable and controllable approach to the fabrication of monolayer polystyrene films on a large-scale.",
publisher = "Univerzitet u Beogradu - Institut za nuklearne nauke Vinča, Beograd",
journal = "Nuclear Technology & Radiation Protection",
title = "Formation of a large-area monolayer of polystyrene film via the spin-coating method",
pages = "251-246",
number = "3",
volume = "33",
doi = "10.2298/NTRP1803246M"
}

Modrić-Šahbazović, A., Novaković, M. M., Đokić, V., Gazdić, I., Bibić, N. M.,& Rakočević, Z. Lj.. (2018). Formation of a large-area monolayer of polystyrene film via the spin-coating method. in Nuclear Technology & Radiation Protection
Univerzitet u Beogradu - Institut za nuklearne nauke Vinča, Beograd., 33(3), 246-251.
https://doi.org/10.2298/NTRP1803246M

Modrić-Šahbazović A, Novaković MM, Đokić V, Gazdić I, Bibić NM, Rakočević ZL. Formation of a large-area monolayer of polystyrene film via the spin-coating method. in Nuclear Technology & Radiation Protection. 2018;33(3):246-251.
doi:10.2298/NTRP1803246M .

Modrić-Šahbazović, Almedina, Novaković, Mirjana M., Đokić, Veljko, Gazdić, Izet, Bibić, Nataša M., Rakočević, Zlatko Lj., "Formation of a large-area monolayer of polystyrene film via the spin-coating method" in Nuclear Technology & Radiation Protection, 33, no. 3 (2018):246-251,
https://doi.org/10.2298/NTRP1803246M . .