Depozition of thin films by CVD techniques
Nanošenje tankih filmova CVD postupcima
dc.creator | Čikara, Deana | |
dc.creator | Raić, Karlo | |
dc.date.accessioned | 2021-03-10T10:15:54Z | |
dc.date.available | 2021-03-10T10:15:54Z | |
dc.date.issued | 2004 | |
dc.identifier.issn | 0354-6306 | |
dc.identifier.uri | http://TechnoRep.tmf.bg.ac.rs/handle/123456789/667 | |
dc.description.abstract | Chemical vapor deposition - (CVD) has rapidly grown in the last twenty years and applications of this fabrication process are now key elements in many industrial products, such as semiconductors, optoelectonics, optics, cutting tools, refractory fibers and many others. The reasons for the success of CVD are simple: (i) CVD is relatively uncomplicated and flexible technology which are accommodate many variations; (ii) with CVD is possible to coat almost any shape of almost any size; (iii) unlike other thin film techniques, CVD can also be used to produce fibers, monoliths and powders and (iv) CVD is economically competitive. Two major contributors to this rapid growth are plasma CVD (PACVD) and metalo-organic CVD (MOCVD), which will be explained in this work. Also, appropriate examples of MOCVD and PACVD experiments will be presented. | en |
dc.description.abstract | Chemical vapor deposition - CVD je proces koji se izuzetno razvio u poslednjih dvadeset godina, a produkti njegove proizvodnje su danas bitni elementi u industriji poluprovodnika, reznog alata, optičkih vlakana, optoelektronici, i mnogim drugim. Razlozi ovakvog uspeha CVD tehnologija su: (i) CVD je relativno jednostavna i fleksibilna tehnologija koja može da se prilagodi velikim varijacijama uslova; (ii) sa CVD tehnologijom moguće je napraviti tanku prevlaku praktično bilo kojeg oblika i veličine; (iii) za razliku od drugih tehnika tankog filma, CVD može da se koristi za proizvodnju vlakana, monolita i prahova i (iv) cena ovog postupka je vrlo konkurentna. Najvažniji oblici CVD su plazma CVD (PACVD) i metalo-organski CVD (MOCVD) postupci čije osnove će biti opisane u ovom radu. Takođe, ovi postupci će biti ilustrovani odgovarajućim primerima. | sr |
dc.publisher | Savez inženjera metalurgije Srbije, Beograd | |
dc.rights | openAccess | |
dc.source | Metalurgija | |
dc.subject | CVD | en |
dc.subject | MOCVD | en |
dc.subject | PACVD | en |
dc.subject | substrate | en |
dc.subject | prekursor | en |
dc.subject | CVD | sr |
dc.subject | MOCVD | sr |
dc.subject | PACVD | sr |
dc.subject | substrat | sr |
dc.subject | prekursor | sr |
dc.title | Depozition of thin films by CVD techniques | en |
dc.title | Nanošenje tankih filmova CVD postupcima | sr |
dc.type | article | |
dc.rights.license | ARR | |
dc.citation.epage | 342 | |
dc.citation.issue | 4 | |
dc.citation.other | 10(4): 329-342 | |
dc.citation.spage | 329 | |
dc.citation.volume | 10 | |
dc.identifier.rcub | https://hdl.handle.net/21.15107/rcub_technorep_667 | |
dc.type.version | publishedVersion |
Files in this item
Files | Size | Format | View |
---|---|---|---|
There are no files associated with this item. |