dc.creator | Nikezić, D | |
dc.creator | Janićijević, Aco | |
dc.date.accessioned | 2021-03-10T10:01:16Z | |
dc.date.available | 2021-03-10T10:01:16Z | |
dc.date.issued | 2002 | |
dc.identifier.issn | 0969-8043 | |
dc.identifier.uri | http://TechnoRep.tmf.bg.ac.rs/handle/123456789/444 | |
dc.description.abstract | The thickness of the layer of LR115 detector removed during etching was measured with a very precise instrument. Dependence of the bulk etch rate on temperature of the etching solution was investigated. It has been found that the etch rate is (3.27 +/- 0.08) mum/h at 60degreesC in 10%NaOH of water solution. It was also found that the track density in the detector irradiated to radon and its progeny increases linearly with the removed layer. | en |
dc.publisher | Pergamon-Elsevier Science Ltd, Oxford | |
dc.rights | restrictedAccess | |
dc.source | Applied Radiation and Isotopes | |
dc.subject | LR115 detector | en |
dc.subject | bulk etch rate | en |
dc.subject | form Talysurf | en |
dc.subject | radon measurements | en |
dc.title | Bulk etching rate of LR115 detectors | en |
dc.type | article | |
dc.rights.license | ARR | |
dc.citation.epage | 278 | |
dc.citation.issue | 2 | |
dc.citation.other | 57(2): 275-278 | |
dc.citation.rank | M22 | |
dc.citation.spage | 275 | |
dc.citation.volume | 57 | |
dc.identifier.doi | 10.1016/S0969-8043(02)00109-4 | |
dc.identifier.pmid | 12150287 | |
dc.identifier.scopus | 2-s2.0-0036272909 | |
dc.identifier.wos | 000176423600018 | |
dc.type.version | publishedVersion | |